Multiscale Modeling in Epitaxial Growth

Gebonden Engels 2005 9783764372088
Verwachte levertijd ongeveer 9 werkdagen

Samenvatting

Epitaxy is relevant for thin film growth and is a very active area of theoretical research since several years. Recently powerful numerical techniques have been used to link atomistic effects at the film's surface to its macroscopic morphology. This book also serves as an introduction into this highly active interdisciplinary field of research for applied mathematicians, theoretical physicists and computational materials scientists.

Specificaties

ISBN13:9783764372088
Taal:Engels
Bindwijze:gebonden
Uitgever:Birkhäuser Basel

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Inhoudsopgave

Atomistic Models.- Lattice Gas Models and Kinetic Monte Carlo Simulations of Epitaxial Growth.- Cluster Diffusion and Island Formation on fcc(111) Metal Surfaces Studied by Atomic Scale Computer Simulations.- A Multiscale Study of the Epitaxial CVD of Si from Chlorosilanes.- Off-lattice Kinetic Monte Carlo Simulations of Strained Heteroepitaxial Growth.- Quasicontinuum Monte Carlo Simulation of Multilayer Surface Growth.- Step Flow Models.- to Step Dynamics and Step Instabilities.- A Finite Element Framework for Burton-Cabrera-Frank Equation.- Edge Diffusion in Phase-Field Models for Epitaxial Growth.- Discretisation and Numerical Tests of a Diffuse-Interface Model with Ehrlich-Schwoebel Barrier.- Islands in the Stream: Electromigration-Driven Shape Evolution with Crystal Anisotropy.- Simulation of Ostwald Ripening in Homoepitaxy.- Continuum Models.- Continuum Models for Surface Growth.- Configurational Continuum Modelling of Crystalline Surface Evolution.- On Level Set Formulations for Anisotropic Mean Curvature Flow and Surface Diffusion.

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        Multiscale Modeling in Epitaxial Growth